Åthena Xcellence® T Series use technology of fast X-ray reflectometry technique (XRR), X-ray fluorescence technique (XRF) at grazing angle(GIXRF) and conventional incident angle (XRF). Åthena Xcellence™ T provides information about film thickness, material composition, density, roughness, etc.. Application is applicable for films, ultra-thin films, complex multilayer structures in advanced as well as mature process. Measurement can be conducted on both non-pattern and pattern wafer.